Near-GeV Electron Beams at a Few Per-Mille Level from a Laser Wakefield Accelerator via Density-Tailored Plasma

Journal:
Physical Review Letters
Published:
DOI:
10.1103/physrevlett.126.214801
Affiliations:
4
Authors:
15
Institutions Authors Share
Shanghai Institute of Optics and Fine Mechanics (SIOM), CAS, China
9.166667
0.61
Shanghai Normal University (SHNU), China
3.500000
0.23
University of Chinese Academy of Sciences (UCAS), China
1.166667
0.08
ShanghaiTech University, China
1.166667
0.08