Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO2 films using VCl4 and water

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0053566
Affiliations:
8
Authors:
8
Institutions Authors Share
University of Central Florida (UCF), United States of America (USA)
6.000000
0.75
EMD Performance Materials, United States of America (USA)
2.000000
0.25