Nonlinear domain wall velocity in ferroelectric Si-doped HfO2 thin film capacitors

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0035753
Affiliations:
2
Authors:
4
Institutions Authors Share
Sogang University, South Korea
3.000000
0.75
Sookmyung Women's University, South Korea
1.000000
0.25