Defect profiling in FEFET Si:HfO2 layers

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0029072
Affiliations:
4
Authors:
18
Institutions Authors Share
Interuniversity Microelectronics Centre (IMEC), Belgium
14.500000
14.500000
0.81
Catholic University of Leuven (KU Leuven), Belgium
2.500000
0.14
Sungkyunkwan University (SKKU), South Korea
0.500000
0.03
KIOXIA Corporation, Japan
0.500000
0.03