Influence of ALD Ru bottom electrode on ferroelectric properties of Hf0.5Zr0.5O2-based capacitors

Journal: Applied Physics Letters

Published: 2020-11-11

DOI: 10.1063/5.0022118

Affiliations: 2

Authors: 5

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Institutions Share
Moscow Institute of Physics and Technology - State University (MIPT), Russia 0.80
Technical Institute for Superhard and Novel Carbon Materials (FSBI TISNCM), Russia 0.20

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