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Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas

Journal: Applied Physics Letters

Published: 2019-08-06

DOI: 10.1063/1.5110219

Affiliations: 2

Authors: 4

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Institutions Share
Korea Research Institute of Standards and Science (KRISS), South Korea 0.75
Division of Electrical Engineering, HYU, South Korea 0.25

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