Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films

Journal: Applied Physics Letters

Published: 2018-09-18

DOI: 10.1063/1.5046844

Affiliations: 1

Authors: 6

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Institutions FC
Fraunhofer Center Nanoelectronic Technologies (CNT), IPMS, Germany 1

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