La-doped Hf0.5Zr0.5O2 thin films for high-efficiency electrostatic supercapacitors

Journal: Applied Physics Letters

Published: 2018-09-18

DOI: 10.1063/1.5045288

Affiliations: 5

Authors: 6

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Institutions FC
Moscow Institute of Physics and Technology - State University (MIPT), Russia 0.67
Department of Materials Science and Engineering, PNU, South Korea 0.08
NaMLab gGmbH, Germany 0.08
Department of Material Science and Engineering (MSE), SNU, South Korea 0.08
Inter-University Semiconductor Research Center (ISRC), SNU, South Korea 0.08

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