High mobility ultra-thin crystalline indium oxide thin film transistor using atomic layer deposition

Journal: Applied Physics Letters

Published: 2018-09-12

DOI: 10.1063/1.5041029

Affiliations: 2

Authors: 7

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Institutions FC
Reality Device Research Division, ETRI, South Korea 0.79
Department of Electro-Mechanical Systems Engineering, KU, South Korea 0.21

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