Nanoscopic studies of domain structure dynamics in ferroelectric La:HfO2 capacitors

Journal: Applied Physics Letters

Published: 2018-05-31

DOI: 10.1063/1.5030562

Affiliations: 3

Authors: 7

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Institutions FC
NaMLab gGmbH, Germany 0.50
Department of Physics and Astronomy, UNL, United States of America (USA) 0.43
Institute of Semiconductors and Microsystems (IHM), TU Dresden, Germany 0.07