A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

Journal:
Chemical Communications
Published:
DOI:
10.1039/d0cc05781a
Affiliations:
5
Authors:
11
Institutions Authors Share
University of Wuppertal, Germany
5.000000
0.45
Ruhr University Bochum (RUB), Germany
4.000000
0.36
Tyndall National Institute (TNI), Ireland
1.500000
0.14
University of Ulster (UU), United Kingdom (UK)
0.500000
0.05