A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

Journal: Chemical Communications

Published: 2020-11-10

DOI: 10.1039/d0cc05781a

Affiliations: 5

Authors: 11

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Institutions Share
University of Wuppertal, Germany 0.45
Ruhr University Bochum (RUB), Germany 0.36
Tyndall National Institute (TNI), Ireland 0.14
University of Ulster (UU), United Kingdom (UK) 0.05