Suppression of atom motion and metal deposition in mixed ionic electronic conductors

Journal: Nature Communications

Published: 2018-07-25

DOI: 10.1038/s41467-018-05248-8

Affiliations: 8

Authors: 15

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Institutions FC
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, SICCAS, China 0.40
Department of Materials Science and Engineering, NU, United States of America (USA) 0.20
University of Chinese Academy of Sciences (UCAS), China 0.07
Materials Genome Institute (MGI), SHU, China 0.07
Department of Physics, SUSTech, China 0.07
Institute of Physical Chemistry, JLU, Germany 0.07
Center for Materials Research (LaMa), JLU, Germany 0.07
Department of Physics, U-M, United States of America (USA) 0.07

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