Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface

Journal: ACS Nano

Published: 2018-09-25

DOI: 10.1021/acsnano.8b06534

Affiliations: 5

Authors: 15

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Institutions FC
Hefei National Laboratory for Physical Sciences at the Microscale (HFNL), China 0.52
Department of Physics, USTC, China 0.16
National Synchrotron Radiation Laboratory (NSRL), USTC, China 0.13
Center for Micro- and Nanoscale Research and Fabrication, USTC, China 0.12
Department of Physics, AHU, China 0.07

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