Impact of S-Vacancies on the Charge Injection Barrier at the Electrical Contact with the MoS2 Monolayer

Journal:
ACS Nano
Published:
DOI:
10.1021/acsnano.0c07982
Affiliations:
3
Authors:
5
Institutions Authors Share
Institute of Materials Research and Engineering (IMRE), A*STAR, Singapore
2.500000
0.50
Institute of High Performance Computing (IHPC), A*STAR, Singapore
2.000000
0.40
National University of Singapore (NUS), Singapore
0.500000
0.10