Molecular Approach for Engineering Interfacial Interactions in Magnetic/Topological Insulator Heterostructures

Journal: ACS Nano

Published: 2020-04-15

DOI: 10.1021/acsnano.0c02498

Affiliations: 7

Authors: 16

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Institutions Share
Catalan Institute of Nanoscience and Nanotechnology (ICN2), BIST, Spain 0.28
Spanish National Research Council (CSIC), Spain 0.28
Department of Materials (D-MATL), ETH Zurich, Switzerland 0.13
ALBA Synchrotron, Spain 0.13
Center of Materials Physics (CFM), Spain 0.06
Institute of Structure of Matter (ISM), CNR, Italy 0.06
Catalan Institution for Research and Advanced Studies (ICREA), Spain 0.06

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