Retarding Ostwald Ripening to Directly Cast 3D Porous Graphene Oxide Bulks at Open Ambient Conditions

Journal: ACS Nano

Published: 2020-05-01

DOI: 10.1021/acsnano.0c02379

Affiliations: 9

Authors: 14

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Institutions Share
Beijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, BIT, China 0.38
MOE Key Laboratory of Cluster Science, BIT, China 0.38
College of Chemical Engineering, QUST, China 0.07
INFN Section in Roma, Italy 0.04
Department of Physics, Sapienza University of Rome, Italy 0.04
INFN Frascati National Laboratory (LNF), Italy 0.04
Rome International Center for Materials Science of Superstripes (RICMASS), Italy 0.04
Department of Chemistry, Tsinghua, China 0.02
Department of Mechanical Engineering (DME), Tsinghua, China 0.02

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