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In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD

Journal: Inorganic Chemistry

Published: 2019-08-19

DOI: 10.1021/acs.inorgchem.9b01631

Affiliations: 3

Authors: 7

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Institutions Share
Department of Chemistry - Ångström Laboratory, UU, Sweden 0.57
Division of Molecular and Condensed Matter Physics, UU, Sweden 0.29
MAX IV Laboratory, LU, Sweden 0.14