Direct Nanomachining on Semiconductor Wafer By Scanning Electrochemical Microscopy

Journal: Angewandte Chemie International Edition

Published: 2020-07-31

DOI: 10.1002/anie.202008697

Affiliations: 6

Authors: 9

Go to article
Institutions Share
MOE Key Laboratory of Micro-systems and Micro-structures Manufacturing, HIT, China 0.30
Center for Precision Engineering, HIT, China 0.30
State Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), XMU, China 0.13
Engineering Research Center of Electrochemical Technologies of Ministry of Education, XMU, China 0.13
Department of Chemistry, XMU, China 0.13
Department of Mechanical and Electrical Engineering, XMU, China 0.02

Return

Except where otherwise noted © 2021 Springer Nature Limited. All Rights Reserved.
partner of AGORA, HINARI, OARE, INASP, ORCID, CrossRef and COUNTER