NH4Be2BO3F2 and γ‐Be2BO3F: Overcoming the Layering Habit in KBe2BO3F2 for the Next‐Generation Deep‐Ultraviolet Nonlinear Optical Materials

Journal: Angewandte Chemie International Edition

Published: 2018-07-16

DOI: 10.1002/anie.201803721

Affiliations: 6

Authors: 13

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Institutions FC
CAS Key Laboratory of Optoelectronic Materials Chemistry and Physics, FJIRSM CAS, China 0.31
Fujian Provincial Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices, XMU, China 0.31
Xinjiang Key Laboratory of Electronic Information Materials and Devices, XTIPC CAS, China 0.15
University of Chinese Academy of Sciences (UCAS), China 0.08
Beijing Center for Crystal Research and Development, TIPC CAS, China 0.08
CAS Key Laboratory of Functional Crystals and Laser Technology, TIPC CAS, China 0.08

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