Superhigh Electromagnetic Interference Shielding of Ultrathin Aligned Pristine Graphene Nanosheets Film

Journal: Advanced Materials

Published: 2020-02-24

DOI: 10.1002/adma.201907411

Affiliations: 5

Authors: 11

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Institutions Share
Shenyang National Laboratory for Materials Science (SYNL), IMR CAS, China 0.48
University of Science and Technology of China (USTC), China 0.30
Northeastern University (NEU), China 0.18
Tsinghua-Berkeley Shenzhen Institute (TBSI), China 0.03